Abstract Details


Lijie Sun

Phd studend of Electric electronics engeerning at University of Manchester

Lijie Sun

Phd studend of Electric electronics engeerning at University of Manchester

Abstract Name:

Deep level defects in dilute AlxGa1-xN alloy

Symposium:

Symposium A: Materials, Modelling, Simulation & Characterisation

Topic:

A1: Electronic Defects & Transport

Abstract Contributing Authors:

L.J. Sun, P. Kruszewski, V.P. Markevich, A.R. Peaker, J. Plesiewicz, P. Prystawko, D. Binks, M.P. Halsall

Abstract Body:

Defects that generate energy levels deep within the bandgap play a pivotal role in influencing the performance of GaN/AlGaN devices. Despite their critical impact, the understanding of many of these deep-level defects remains limited [1]. This limitation primarily stems from the challenge of deciphering the intricate interplay among various types of defects and impurities present in typical GaN/AlGaN structures.
In this work, we study defects with deep levels in high-quality dilute AlxGa1-xN samples grown by metal-organic vapor phase epitaxy (MOVPE) on highly conductive native ammono-GaN substrates. The AlxGa1-xN samples have been characterized by using a combination of deep-level transient spectroscopy (DLTS), high-resolution Laplace DLTS (L-DLTS) and low-temperature photoluminescence (PL) spectroscopy.
Using L-DLTS, we find that the electron emission signal associated with the FeGa acceptor level in AlxGa1-xN splits into individual components attributed to fluctuations in aluminum concentration within the second-nearest neighbor (2NN) shell around the FeGa impurity atoms (Fig. 1a). Calculations of the probability of encountering a specific number of aluminum atoms in the 2NN shell of the FeGa defect align closely with experimental concentrations determined from Laplace DLTS peak intensities (Fig. 2). This observation indicates that in MOVPE-grown dilute AlxGa1-xN layers, aluminum and iron atoms exhibit a random distribution in the material. Furthermore, our findings demonstrate that the energy level of the FeGa acceptor with no Al atoms in the 2NN shell in the AlxGa1-xN samples shifts linearly with the aluminium content and the shifts are 28 and 55 meV relative to that in GaN for the samples with x = 0.025 and 0.05, respectively (Fig.1b). 
We also observe that the position, shape and relative intensities of the PL peaks associated with the FeGa(0/-) defect change with aluminum concentration (Fig. 3). The relative intensities of the PL peaks associated with different numbers of Al atoms in the 2NN shell around Fe defects are also found to be consistent with a random distribution of Al and Fe atoms. The variation of the intensity of these PL peaks with excitation photon energy is also used to determine the position of the FeGa acceptor level relative to the valance band.
 
References.
[1] M. Meneghini et al. J. Appl. Phys. 130, 181101 (2021).

Attached Figure:

Lijie figure.png

Submission Type:

Talk

Our Partners

The exciting conference programme is co-convened with the following partners:

Our Sponsors

ICANS30 is proudly sponsored by: