We present a unique opportunity of ‘seeing’ physical (and chemical) properties of 2D materials and heterostructures on (sub)nanoscale. Using a combination of advances functional scanning probe microscopy (SPM) techniques, we perform a detailed local study of electrical, electronic, optoelectronic, and thermal properties. These studies are complemented by development of scanning gate microscopy techniques, where the gate can be a local source of electric/magnetic field, heat or near-field. We thus combine functional imaging with an active control and manipulation of the device properties. We demonstrate that advanced functional SPM techniques are a very powerful tool to obtain detailed information on the unique sample properties (such as the effect of non-uniformity, defects, degree of molecular absorption, etc.), which are not assessable by more traditional methods. We also demonstrate the accuracy of the measurements, which allows us to eliminate the common artefacts, which are not usually taken into account in many other approaches. The present work facilitates development of realistic 2D materials devices and their faster and reliable implementation.

We also aim to showcase the measurement capability associated with the quantum material nanoprobe facilities for the research and applications of materials for quantum technologies, at scales ranging from several micrometers down to individual atoms.

1.       V. Panchal, et al., Scientific Reports 3, 2597 (2013)

2.       M. Munz, et al., ACS Nano 9, 8401 (2015)

3.       C. E. Giusca, et al. ACS Nano 10, 7840 (2016)

4.       Ch. Melios, et al., 2D Materials, Topical Review 5, 022001 (2018)

5.       T. Vincent, et al., 2D Materials 6, 015022 (2019)

6.       S. Ulstrup, et al., Nature Communication 10, 3283 (2019)

7.       Ch. Melios, et al. Sci Reports 10, 3223 (2020)

8.       D. Buckley, et al., Advanced Functional Materials 31, 2008967 (2020)

9.       T. Vincent, et al., Applied Physics Reviews 8, 041320 (2021)

10.      A. Weston, et al., Nature Nanotechnology 17, 390 (2022)