Abstract Details


Jun Xu

Professor at Nantong University

Jun Xu

Professor at Nantong University

Abstract Name:

Doping of Phosphorus or/and Boron in Silicon Nanocrystals-based Multilayers

Symposium:

Symposium B: Materials Discovery, Modification & Functionalisation

Topic:

B1: Nanoscale Semiconductors

Abstract Contributing Authors:

Jun Xu1,2*, Dongke Li2, Junnan Han2 and Kunji Chen2 1School of Microelectronics and Integrated Circuit, Nantong University, Nantong 226019, China 2National Laboratory of Solid State Microstructures and School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China *xjun@ntu.edu.cn or junxu@nju.edu.cn (Corresponding author: Jun Xu)

Abstract Body:

Silicon nanocrystals (Si NCs) have attracted much attention nowadays because of their novel properties and potential applications in many kinds of nano-devices. In order to further improve the device performance, realizing effective doping in Si NCs is a crucial subject. However, the doping in nano-scaled semiconductors is quite complicated and difficult as revealed both in theoretical and experimental studies. Here, we report the systematically study on Phosphorus (P) or/and Boron (B) doping in Si NCs-based multilayers. The comparative study on the favourite occupy sites of P、B singly and co-doping in Si NCs has been carried out theoretically. We demonstrate the substitutional doping can be achieved even in the small-sized Si NCs experimentally and high conductivity can be obtained. It is also found that the light emission can be enhanced by suitable P doping More interesting, the sub-band light emission has been observed for P-doped Si NCs and the corresponding model is proposed and the improved sub-band emission is realized by P/B co-doping. The work is supported by NSFC (No. 61921005) and National Key R&D Program of China (2018YFB2200101). 

Submission Type:

Talk

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